Determination of Hydrolysis Ratio of Silicic Ester on the Surface of Coated Films by X-Ray Photoelectron Spectroscopy (XPS)
Rie TOMITA*, Satoshi URANO and Shigemi KOHIKI†
Nippon Paint Co. Ltd.; 19-17, Ikedanaka-machi, Neyagawa-shi 572-8501 Japan
† Kyushu Institute of Technology; 1-1, Sensui-cho, Tobata-ku, Kitakyushu-shi 804-8550 Japan
The hydrolysis ratio of silicic ester on the surface of coated films was analyzed quantitatively by X-ray photoelectron spectroscopy using monochromatized AlKα X-rays. Alkoxy groups were selectively decomposed on irradiation of non-monochromatized MgKα X-rays to coated silicate films. This phenomenon could be used for determination of the number of alkoxy groups bonded to one silicon atom. This method was applied to evaluate the hydrolysis ratio of various silicic ester coating films. A good correlation was obtained between hydrolysis ratio which was measured by XPS and water contact angle which indicate hydrophilicity of the surface of coated films.
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